하모니 개발 장비

Combi Co-Sputter

Combinatorial multi-target co-sputtering system

  • 3 target guns (2 inch diameter)
  • Overlapping of 3 target source materials
    (more than 400 combinatorial thin film chips on a 4-inch wafer)
  • Moving shutter
  • Heater for substrate

Application

  • Fabrication of non-volatile memory capacitor
    (for PRAM, MRAM and FRAM)
  • combi-array for development of new metallic materials

Specification

Deposition Temperature R.T. ~ 500℃
Deposition Pressure 10⁻⁷ ~ 10⁻¹ Torr (Turbomolecular Pump)
Thermal Uniformity -1 ~ +1% (at 4 in water)
Process Gas Ar, N₂, O₂

controller

Natural composition spread

Square discrete library spread

Combi Multi-Target Sputter

Combinatorial multi-target sputtering system

  • 4 target guns (4 inch diameter)
  • Easiness of target gun change
    (target gun rotation part & target gun up-down part)
  • moving shutter (for concentration gradient)
  • 2500 chips/wafer
  • All the process controlled by computer program

Application

  • Fabrication of non-volatile memory capacitor
    (for PRAM, MRAM and FRAM)
  • combi-array for development of new metallic materials

Specification

Deposition Temperature R.T. ~ 500℃
Deposition Pressure 10⁻⁷ ~ 10⁻¹ Torr (Turbomolecular Pump)
Thickness Uniformity -3 ~ +3% (at 4 in water)
Thermal Uniformity -1 ~ +1% (at 4 in water)
Process Gas Ar, N₂, O₂

Schematic drawing

Target gun rotation part

Target gun up-down part

LSMCD-Explorer

Liquid source misted chemical deposition system

  • Moving shutter (for concentration gradient)
  • Excellent uniformity of combi-array (mixing liquid sources)
  • Easiness of composition control
  • All the process controlled by computer program

Application

  • Fabrication of non-volatile memory capacitor
    (for PRAM, MRAM and FRAM)
  • combi-array for development of new metallic materials

Specification

Deposition Temperature R.T. ~ 200℃
Deposition Pressure 10⁻⁷ ~ 760 Torr (Rotary Pump)
Thickness Uniformity -3 ~ +3% (at 4 in water)
Thermal Uniformity -1 ~ +1% (at 4 in water)

Ferroelectric combi-chip

Moving shutter

controller

PolyCat Accelerator

Parallel Polymerization Reactor System

  • Individually Controlled Temperature and Pressure
  • Designed by CUPS researchers
  • Obtained Patent (KR0322689)
  • controlled by Lab-view software

Application

  • Optimizations of Olefin Polymerization Conditions
  • High-Throughput Screening for Olefin Polymerization Catalysts
  • High-Throughput Screening for Organic Reaction Catalysts

Specification

Number of reactors 8
Reactor volume 20cc
Reactor material Stainless steel with glass vessel
Reactor temperature R.T ~ 90℃
Reactor pressure 1 ~ 10 atm
Stirring speed 0 ~ 600 rpm
Anaerobic condition Available
Vacuum Available

Operation Software

8 reactors

One reactor including a 20 mL glass vessel

Micro Multi Spectrometer

Micro-Raman/UV-VIS/Fluorescence Spectrometer

  • Scanning & Image mapping
  • Sample type : liquid, powder, thin film
  • X Y manipulation controlled by computer (resolution < 1 μm)

Application

  • Characterization of several materials
    (Electronic materials, Catalyses, Biomaterials, Carbon materials)
  • Chemical reaction analysis
  • Fluid analysis inside microchannels

Specification

[source]
Raman UV/VIS, Fluorescence		 Ar ion laser (488nm)
Deutrium lamp (UV, 185 ~ 350 nm)
Tungsten lamp (VIS, 350 nm)
[Spectra range]
Raman UV/VIS, Fluorescence		 -25 ~ 4000 cm
230 ~ 1000 nm
CCD detector 1340 x 400 pixels
Sample size > 5 μm
Scan range 100 x 100 mm² (200 x 200 array)

Library sample

Thin film sample data

Liquid sample data

SUPER-I

Successful Ubiquitous Parallel Economic Reactor

  • Top-loading Graphite seals
  • Removable cartridge for rapid reloading
  • Flow-Equalization Capillaries
  • Controlled by Lab-view software

Application

  • Most of heterogeneous catalytic reaction
    ex) DeNOx reaction
    Oxidative dehydrogenation of light alkanes
    Oxygenation of hydrocarbon etc.

Specification

Sealing material Graphite gasket
Number of reactor 64
Reactor well volume 0.5cc
Catalyst weight 10 ~ 200 mg
Reactor material Stainless steel
Reactor temperature R.T ~ 450℃
Reactor pressure Ambient
Flow rate Up to 30sccm/well
Analysis Online connection to GC, MS

Reactor Body

Inner view of reactor body

Library sample

SUPER2

Successful Ubiquitous Parallel Economic Reactor

  • Individual temperature control
  • High temperature reaction
  • Removable quartz reactor for rapid reloading
  • Flow-Equalization Capillaries
  • Controlled by Lab-view sofrware

Application

  • Most of heterogeneous catalytic reaction
    ex) DeNOx reaction
    Steam and CO₂ Reforming
    Partial oxidation of hydrocarbon etc.

Specification

Sealing material Graphite
Number of reactor 32
Reactor size ¼ inch
Catalyst weight ~ 500 mg
Reactor material quartz
Reactor temperature R.T ~ 1000℃
Reactor pressure 1 atm
Flow rate Unlimited
Analysis GC or MS

Reactor Body

Output connection

View of reactor system

Combinatorial Metal Evaporator